The effect of deposition angle on the structural properties of deposited Zn
thin metallic film was studied. The films were deposited obliquely at different
angles (0º, 50º, 60º, 70ºand 80º) by vaccum evaporation with resistive heating
technique at different deposition angles. XRD technique used to study the
crystalline structure of these films .confirm the polycrystalline nature of these
films and the higher intensity accompanied that deposited with (70˚). Some
structural parameters such as grain size, micro strain, shape factor, number of
layers as a function of deposition angle were calculated. The surface morphology
of the deposited materials has been studied using atomic force microscopes
(AFM) and optical reflection microscope. The AFM results revel an increase in
the film's roughness from (33.7 to 39.2) nm when ◦ change from 0◦ to 80◦.
Reflection microscope results showed that the smoothness and homogeneity of
the films are decreasing with increasing the deposition angle Ө˚, and the
surface roughness increased with increasing angle.
Keywords: oblique deposition, thin films, X-ray diffraction.
|